- All sections
- C - Chemistry; metallurgy
- C02F - Treatment of water, waste water, sewage, or sludge
- C02F 1/20 - Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
Patent holdings for IPC class C02F 1/20
Total number of patents in this class: 1072
10-year publication summary
|
96
|
92
|
107
|
109
|
90
|
92
|
92
|
74
|
74
|
24
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Kurita Water Industries Ltd. | 1110 |
44 |
| Mitsubishi Heavy Industries, Ltd. | 8217 |
27 |
| Evoqua Water Technologies LLC | 904 |
22 |
| Organo Corporation | 394 |
20 |
| Veolia Water Solutions & Technologies Support | 547 |
19 |
| Orege | 36 |
16 |
| Anaergia Inc. | 111 |
13 |
| Massachusetts Institute of Technology | 9795 |
8 |
| Anschutz Exploration Corporation | 10 |
8 |
| Heartland Water Technology, Inc. | 30 |
8 |
| Chevron U.S.A. Inc. | 3774 |
7 |
| Hitachi, Ltd. | 16452 |
6 |
| Covestro Deutschland AG | 2429 |
6 |
| MKS Instruments, Inc. | 698 |
6 |
| Nomura Micro Science Co., Ltd. | 67 |
6 |
| Outset Medical, Inc. | 58 |
6 |
| FUJIFILM Corporation | 27102 |
5 |
| Bill & Melinda Gates Foundation, William H. Gates III and Melinda F. Gates, both US citizens | 28 |
5 |
| Bion Environmental Technologies, Inc. | 8 |
5 |
| General Electric Technology GmbH | 1657 |
5 |
| Other owners | 830 |